Abstract:
MXenes are a fast-growing family of two-dimensional carbides and nitrides with unique properties such as high electrical conductivity, mechanical strength, hydrophilicity, and tunable surface chemistry. These features make them highly attractive for energy storage, electromagnetic interference (EMI) shielding, catalysis, and flexible electronics. Yet their synthesis remains the main barrier to industrial adoption.
Conventional top-down routes based on hydrofluoric acid (HF) etching of MAX phases are hazardous, energy-intensive, and compositionally rigid. In parallel, several bottom-up strategies such as chemical vapor deposition (CVD), plasma-enhanced pulsed layer deposition (PEPLD), template methods, or direct synthesis have been explored. While safer, these methods face major drawbacks including high energy requirements, poor structural control, low reproducibility, and limited scalability.